The sheer candor about fragmentation from this collection of executives is difficult to ignore, however, given just how often we see big, bold tech claims coming from Chinese media, but it aligns with an increasingly obvious challenge. China’s most advanced domestically produced DUV lithography system, from Yuliangsheng, is technically comparable to ASML’s Twinscan NXT:1950i — a machine ASML originally designed for 32nm-class processes back in 2008.

Even if SMIC manages to integrate that tool into a 28nm process by 2027, reaching sub-10nm would require redesigned scanners and several additional years of development. A prototype EUV machine has reportedly been completed in a Shenzhen lab, but EUV’s commercial viability requires solving yield challenges that took ASML nearly two decades to overcome after its own prototype.